Patent · US Active

Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber

US10692705B2 · kind B2 · utility

4Cited by

36References

23Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Mihail Mihaylov · San Jose, US
Xinkang Tian · Fremont, US
Ching-Ling Meng · Fremont, US
Jason Ferns · Sunnyvale, US
Joel Ng · Fremont, US
Badru D. Hyatt · Fremont, US
Zheng Yan · Short Hills, US
Vi Vuong · Fremont, US

Key dates

Filing date	Nov 15, 2016
Grant date	Jun 23, 2020
Priority date	—
Expiry date	Feb 9, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG01J2001/4247
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.