Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatus
US10700166B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2013 |
| Grant date | Jun 30, 2020 |
| Priority date | — |
| Expiry date | Oct 18, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B1/36
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A nozzle cleaning device is capable of uniformly cleaning a nozzle from a front end of the nozzle to an upper part thereof. The nozzle cleaning device includes a storage tank, a liquid discharging portion and an overflow discharging portion. The storage tank has a cylindrical inner peripheral surface and is configured to store therein a cleaning liquid that cleans a nozzle used in a substrate process. The liquid discharging portion is configured to discharge the cleaning liquid into the storage tank toward a position eccentric with respect to a central axis of the cylindrical inner peripheral surface to store the cleaning liquid within the storage tank and configured to form a vortex flow of the cleaning liquid revolving within the storage tank. The overflow discharging portion is configured to discharge the cleaning liquid that overflows the storage tank.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.