Negative-working photoresist compositions for laser ablation and use thereof
US10705424B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Jun 21, 2017 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | Jun 21, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition crosslinkable by broad band UV radiation, which after cross-linking is capable of cold ablation by a UV Excimer Laser emitting between 222 nm and 308 nm, where the composition is comprised of a negative tone resist developable in aqueous base comprising and is also comprised of a conjugated aryl additive absorbing ultraviolet radiation strongly in a range between from about 220 nm to about 310 nm.The present invention also encompasses a process comprising steps a), b) and c) The present invention also encompasses a process comprising steps a′), b′) c′) and d′)
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.