Weihong Liu
16Patents
4h-index
32Co-inventors
56Inventor score
Filing activity: Nov 21, 2007 → Nov 12, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8039201B2 | Antireflective coating composition and process thereof | Physics | 9 | Active |
| US8906594B2 | Negative-working thick film photoresist | Chemistry; Metallurgy | 5 | Active |
| US9252893B2 | Methods for determining a beam-forming gain parameter, user equipment, base station, computer programs and computer program products | Electricity | 4 | Active |
| US8841062B2 | Positive working photosensitive material | Physics | 4 | Active |
| US9012126B2 | Positive photosensitive material | Physics | 3 | Active |
| US11066805B2 | Measuring device and method for horizontal dynamic impedance of specified foundation depth based on differential response analysis of pulse excitation | Physics | 1 | Active |
| US10773182B2 | Multi-stage evaporation system enhanced by a gravity-reduced field | Performing Operations; Transporting | 1 | Active |
| US11385543B2 | Enviromentally stable, thick film, chemically amplified resist | Physics | 0 | Active |
| US12058534B2 | Method of measuring AAS EMF | Electricity | 0 | Active |
| US12393115B2 | Positive working photosensitive material | Physics | 0 | Active |
| US11043001B2 | High precision object location in a parking lot | Electricity | 0 | Active |
| US11698586B2 | Negative-working ultra thick film photoresist | Physics | 0 | Active |
| US12276909B2 | Novolak/DNQ based, chemically amplified photoresist | Physics | 0 | Active |
| US11822242B2 | DNQ-type photoresist composition including alkali-soluble acrylic resins | Physics | 0 | Active |
| US10976662B2 | Positive working photosensitive material | Physics | 0 | Active |
| US10705424B2 | Negative-working photoresist compositions for laser ablation and use thereof | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.