Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle
US10707099B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2017 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | Apr 16, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2203/0229
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The wafer processing system includes a rotatable wafer support member for supporting a wafer and a plurality of collections trays disposed about a peripheral edge of the wafer support member. The collection trays are arranged in a stacked configuration, each collection tray having an inner wall portion and an outer wall portion that converge to define a trough section for collecting fluid. The system includes a chamber exhaust outlet that is formed in the housing for venting gas from the interior of the housing outside of the collection trays and a chemical exhaust outlet that is formed in the housing for venting gas that flows through the collection chamber to the chemical exhaust outlet. The chemical exhaust outlet is fluidly isolated from the chamber exhaust outlet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.