Patent · US Active

Method for manufacturing a membrane assembly

US10712656B2 · kind B2 · utility

4Cited by
1References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 26, 2016
Grant dateJul 14, 2020
Priority date
Expiry dateApr 23, 2037

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70983
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.