Methods of forming nanostructures using self-assembled nucleic acids, and nanostructures thereof
US10741382B2 · kind B2 · utility
19Cited by
1References
24Claims
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Key dates
| Filing date | Oct 31, 2017 |
| Grant date | Aug 11, 2020 |
| Priority date | — |
| Expiry date | Oct 31, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/118
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of forming a nanostructure comprises forming a directed self-assembly of nucleic acid structures on a patterned substrate. The patterned substrate comprises multiple regions. Each of the regions on the patterned substrate is specifically tailored for adsorption of specific nucleic acid structure in the directed self-assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.