Radial lithographic source homogenizer
US10748671B2 · kind B2 · utility
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1References
20Claims
0Family size
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Key dates
| Filing date | Jul 10, 2018 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Mar 12, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/046
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A method includes identifying a contamination region of a collector in a light source, positioning a subset of a plurality of movable light-blocking elements around a periphery of a circular aperture of the light source to compensate for the contamination region, and transmitting light from the light source through the circular aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.