Erik Robert Hosler
11Patents
2h-index
8Co-inventors
39Inventor score
Filing activity: Dec 5, 2014 → Sep 29, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9541839B2 | Method and device for splitting a high-power light beam to provide simultaneous sub-beams to photolithography scanners | Physics | 3 | Active |
| US10996564B2 | Uniformity control of metal-based photoresists | Electricity | 2 | Active |
| US9844124B2 | Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer metrology | Electricity | 2 | Active |
| US9392679B2 | Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer processing | Electricity | 2 | Active |
| US9754829B2 | Self-aligned conductive polymer pattern placement error compensation layer | Electricity | 2 | Active |
| US12022599B2 | Polarization-multiplexed radiator system, light source system, and method of operation | Electricity | 1 | Active |
| US9633942B1 | Conductively doped polymer pattern placement error compensation layer | Electricity | 1 | Active |
| US10444645B1 | Balancing collector contamination of a light source by selective deposition | Physics | 0 | Active |
| US9704807B2 | Pattern placement error compensation layer | Electricity | 0 | Active |
| US10748671B2 | Radial lithographic source homogenizer | Physics | 0 | Active |
| US9748176B2 | Pattern placement error compensation layer in via opening | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.