Patent · US Active

System architecture for combined static and pass-by processing

US10752987B2 · kind B2 · utility

0Cited by

3References

14Claims

0Family size

Assignee

INTEVAC, INC. · US

Inventors

Patrick Leahey · San Jose, US
Eric C. Lawson · Sunnyvale, US
Charles Liu · Chapel Hill, US
Terry Bluck · Santa Clara, US
Kevin Fairbairn · Los Gatos, US
Robert Ruck · San Jose, US
Samuel D. Harkness, IV · Berkeley, US

Key dates

Filing date	Feb 19, 2018
Grant date	Aug 25, 2020
Priority date	—
Expiry date	Aug 5, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3488
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Disclosed is a substrate processing system which enables combined static and pass-by processing. Also, a system architecture is provided, which reduces footprint size. The system is constructed such that the substrates are processed therein vertically, and each chamber has a processing source attached to one sidewall thereof, wherein the other sidewall backs to a complementary processing chamber. The chamber system can be milled from a single block of metal, e.g., aluminum, wherein the block is milled from both sides, such that a wall remains and separates each two complementary processing chambers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.