Process for indium or indium alloy deposition and article

US10753007B2 · kind B2 · utility

Assignee

• Atotech Deutschland GmbH & Co. KG · DE

Inventors

• Grigory VAZHENIN · Berlin, DE
• Jan SPERLING · Berlin, DE
• Stefan Pieper · Haltern, DE
• Mauro CASTELLANI · Berlin, DE
• Andreas Kirbs · Berlin, DE
• Dirk Rohde · Berlin, DE

Key dates

• Filing date: Oct 4, 2016
• Grant date: Aug 25, 2020
• Expiry date: Jun 26, 2037

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C25F5/00
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The present invention deals with a process for deposition of indium or indium alloys and an article obtained by the process, wherein the process includes the steps