Imaging optical system for microlithography

US10754132B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Olaf Rogalsky · Oberkochen, DE
• Sonja Schneider · Lehrberg, DE
• Boris Bittner · Roth, DE
• Jens Kugler · Heubach, DE
• Bernhard Gellrich · Aalen, DE
• Rolf Freimann · Aalen, DE

Key dates

• Filing date: Mar 8, 2013
• Grant date: Aug 25, 2020
• Expiry date: Aug 9, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70891
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An imaging optical system, in particular a projection objective, for microlithography, includes optical elements to guide electromagnetic radiation with a wavelength in a path to image an object field into an image plane. The imaging optical system includes a pupil, having coordinates (p, q), which, together with the image field, having coordinates (x, y) of the optical system, spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q), as a function of which a wavefront W(x, y, p, q) of the radiation passing through the optical system is defined. The wavefront W can therefore be defined in the pupil plane as a function of an extended 4-dimensional pupil space spanned by the image field (x, y) and the pupil (p, q) as W(x, y, p, q)=W(t), with t=(x, y, p, q).