Patent · US Active

Spacer with laminate liner

US10755918B2 · kind B2 · utility

0Cited by
4References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 16, 2018
Grant dateAug 25, 2020
Priority date
Expiry dateNov 16, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/021
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present disclosure relates to semiconductor structures and, more particularly, to a spacer with laminate liner and methods of manufacture. The structure includes: a replacement metal gate structure; a laminate low-k liner on the replacement metal gate structure; and a spacer on the laminate low-k liner.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.