Man Gu
22Patents
2h-index
29Co-inventors
49Inventor score
Filing activity: Mar 27, 2017 → Oct 7, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10777463B2 | Formation of epi source/drain material on transistor devices and the resulting structures | Electricity | 2 | Active |
| US11234067B1 | Headphone structure | Electricity | 2 | Active |
| US11211453B1 | FinFET with shorter fin height in drain region than source region and related method | Electricity | 0 | Active |
| US11374002B2 | Transistors with hybrid source/drain regions | Electricity | 0 | Active |
| US10008456B1 | Laminated spacers for field-effect transistors | Electricity | 0 | Active |
| US11239366B2 | Transistors with an asymmetrical source and drain | Electricity | 0 | Active |
| US11410998B2 | LDMOS finFET structure with buried insulator layer and method for forming same | Electricity | 0 | Active |
| US11289474B2 | Passive devices over polycrystalline semiconductor fins | Electricity | 0 | Active |
| US12132080B2 | FinFET with shorter fin height in drain region than source region and related method | Electricity | 0 | Active |
| US10755918B2 | Spacer with laminate liner | Electricity | 0 | Active |
| US10192791B1 | Semiconductor devices with robust low-k sidewall spacers and method for producing the same | Electricity | 0 | Active |
| US11843034B2 | Lateral bipolar transistor | Electricity | 0 | Active |
| US11101364B2 | Field-effect transistors with diffusion blocking spacer sections | Electricity | 0 | Active |
| US11545575B2 | IC structure with fin having subfin extents with different lateral dimensions | Electricity | 0 | Active |
| US12389616B2 | Transistors with multiple silicide layers | Electricity | 0 | Active |
| US10964598B2 | Methods of forming source/drain regions of a FinFET device and the resulting structures | Electricity | 0 | Active |
| US10971625B2 | Epitaxial structures of a semiconductor device having a wide gate pitch | Electricity | 0 | Active |
| US11532745B2 | Integrated circuit structure including asymmetric, recessed source and drain region and method for forming same | Electricity | 0 | Active |
| US12349459B1 | High-voltage semiconductor device structures | Electricity | 0 | Active |
| US12020937B2 | Carbon implantation for thicker gate silicide | Electricity | 0 | Active |
| US11721722B2 | Bipolar junction transistors including a stress liner | Electricity | 0 | Active |
| US12295161B2 | Trench isolation having three portions with different materials, and LDMOS FET including same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.