Low pressure wire ion plasma discharge source, and application to electron source with secondary emission
US10763070B2 · kind B2 · utility
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Key dates
| Filing date | Jan 12, 2017 |
| Grant date | Sep 1, 2020 |
| Priority date | — |
| Expiry date | Jan 12, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J35/116
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed is a low pressure wire ion plasma discharge source including an elongated ionization chamber housing at least two parallel anode wires extending longitudinally within the ionization chamber. A first of the at least two anode wires is connected to a DC voltage supply and a second of the at least two anode wires is connected to a pulsed voltage supply.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.