Herve A. Besaucele
24Patents
13h-index
50Co-inventors
80Inventor score
Filing activity: Mar 4, 1998 → Jan 12, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6128323A | Reliable modular production quality narrow-band high REP rate excimer laser | Electricity | 171 | Expired |
| US6018537A | Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser | Electricity | 161 | Expired |
| US6005879A | Pulse energy control for excimer laser | Electricity | 146 | Expired |
| US6567450B2 | Very narrow band, two chamber, high rep rate gas discharge laser system | Electricity | 144 | Expired |
| US5991324A | Reliable. modular, production quality narrow-band KRF excimer laser | Electricity | 139 | Expired |
| US6625191B2 | Very narrow band, two chamber, high rep rate gas discharge laser system | Electricity | 136 | Expired |
| US6330261A | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser | Electricity | 60 | Expired |
| US5978405A | Laser chamber with minimized acoustic and shock wave disturbances | Electricity | 49 | Expired |
| US6188710A | Narrow band gas discharge laser with gas additive | Electricity | 48 | Expired |
| US6067306A | Laser-illuminated stepper or scanner with energy sensor feedback | Electricity | 40 | Expired |
| US6704339B2 | Lithography laser with beam delivery and beam pointing control | Electricity | 28 | Expired |
| USRE38054E1 | Reliable, modular, production quality narrow-band high rep rate F2 laser | General | 22 | Expired |
| US6985508B2 | Very narrow band, two chamber, high reprate gas discharge laser system | Electricity | 20 | Expired |
| US6553049B1 | ArF laser with low pulse energy and high rep rate | Electricity | 13 | Expired |
| US7567607B2 | Very narrow band, two chamber, high rep-rate gas discharge laser system | Electricity | 12 | Expired |
| US6801560B2 | Line selected F2 two chamber laser system | Electricity | 12 | Expired |
| US7741639B2 | Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control | Electricity | 11 | Active |
| US7835414B2 | Laser gas injection system | Electricity | 8 | Active |
| US7218661B2 | Line selected F2 two chamber laser system | Electricity | 4 | Expired |
| US7058107B2 | Line selected F2 two chamber laser system | Electricity | 4 | Expired |
| US7061961B2 | Very narrow band, two chamber, high rep-rate gas discharge laser system | Electricity | 3 | Expired |
| US7471708B2 | Gas discharge laser output light beam parameter control | Electricity | 3 | Expired |
| US10763070B2 | Low pressure wire ion plasma discharge source, and application to electron source with secondary emission | Electricity | 0 | Active |
| US9779945B2 | Method and apparatus for irradiating a semiconductor material surface by laser energy | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.