Methods for controlling plasma glow discharge in a plasma chamber
US10777386B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2017 |
| Grant date | Sep 15, 2020 |
| Priority date | — |
| Expiry date | Jul 21, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/24
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for controlling glow discharge in a plasma chamber are disclosed. One method includes connecting a radio frequency (RF) generator to a top electrode of a chamber, the chamber having chamber walls coupled to ground and connecting the RF generator to a bottom electrode of the chamber. Identifying a process operation of deposition to be performed in the chamber and setting an RF signal from the RF generator to be supplied to the top electrode at a first phase. And, setting the RF signal from the RF generator to be supplied to the bottom electrode at a second phase. The first phase and the second phase being adjustable to a phase difference to cause the plasma glow discharge to be controllably positioned within the chamber based on the phase difference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.