Patent · US Active

Etchant composition and silane compound

US10781371B2 · kind B2 · utility

1Cited by
2References
16Claims
0Family size

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Key dates

Filing dateMay 24, 2019
Grant dateSep 22, 2020
Priority date
Expiry dateMay 24, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/32134
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An etchant composition includes phosphoric acid and a silane compound represented by the following Chemical Formula 1: wherein A is an n-valent radical, L is C1-C5 hydrocarbylene, R1 to R3 are independently hydrogen, hydroxy, hydrocarbyl, or alkoxy, in which R1 to R3 exist respectively or are connected to each other by a heteroelement, and n is an integer of 2 to 5.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.