SK-Materials Co., Ltd.
9Patents
9Active
9Granted
44Portfolio score
Filing activity: Feb 17, 2015 → Sep 2, 2020
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10836962B2 | Etchant composition, method of etching insulating film, method of manufacturing semiconductor device, and silane compound | Electricity | 1 | Active |
| US10781371B2 | Etchant composition and silane compound | Electricity | 1 | Active |
| US11186772B2 | Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices | Electricity | 0 | Active |
| US11028321B2 | Etching composition, method for etching insulating layer of semiconductor devices and method for preparing semiconductor devices | Chemistry; Metallurgy | 0 | Active |
| US10934167B2 | Preparation method of trifluoroamine oxide | Performing Operations; Transporting | 0 | Active |
| US11066601B2 | Composition for etching, method for etching insulator and method for manufacturing semiconductor device, and novel compounds | Electricity | 0 | Active |
| US11236116B2 | Silicon compound | Chemistry; Metallurgy | 0 | Active |
| US10941341B2 | Etching composition additive, method for preparing the same and etching composition comprising the same | Electricity | 0 | Active |
| US9586820B2 | Apparatus for preparing germane gas and method for preparing monogermane gas using same | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.