Method for forming a functionalised assembly guide
US10784108B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 2017 |
| Grant date | Sep 22, 2020 |
| Priority date | — |
| Expiry date | Oct 20, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming a functionalised assembly guide intended for the self-assembly of a block copolymer by graphoepitaxy, includes forming on the surface of a substrate a neutralisation layer made of a first material having a first neutral chemical affinity with regard to the block copolymer; forming on the neutralisation layer a first mask including at least one recess; depositing on the neutralisation layer a second material having a second preferential chemical affinity for one of the copolymer blocks, in such a way as to fill the at least one recess of the first mask; and selectively etching the first mask relative to the first and second materials, thereby forming at least one guide pattern made of the second material arranged on the neutralisation layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.