Patent · US Active

Metrology method and apparatus, computer program and lithographic system

US10788757B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Su-Ting CHENG · Eindhoven, NL
Sergei Sokolov · Las Piñas, PH
Armand Eugene Albert Koolen · Nuth, NL

Key dates

Filing date	Apr 9, 2019
Grant date	Sep 29, 2020
Priority date	—
Expiry date	Apr 9, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70941
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.