Patent · US Active

Aqueous indium or indium alloy plating bath and process for deposition of indium or an indium alloy

US10793962B2 · kind B2 · utility

0Cited by

7References

12Claims

0Family size

Assignee

Atotech Deutschland GmbH & Co. KG · DE

Inventors

Jan SPERLING · Berlin, DE
Stefan Pieper · Haltern, DE
Grigory VAZHENIN · Berlin, DE
Mauro CASTELLANI · Berlin, DE
Andreas Kirbs · Berlin, DE
Dirk Rohde · Berlin, DE

Key dates

Filing date	Jan 25, 2017
Grant date	Oct 6, 2020
Priority date	—
Expiry date	Aug 3, 2037

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC25D5/611
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

An aqueous indium or indium alloy plating bath comprising

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.