Device/health of line (HOL) aware eBeam based overlay (EBO OVL) structure
US10804170B2 · kind B2 · utility
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8References
14Claims
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Key dates
| Filing date | Mar 11, 2019 |
| Grant date | Oct 13, 2020 |
| Priority date | — |
| Expiry date | Mar 11, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/038
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present disclosure relates to a method which includes generating a device layout of an eBeam based overlay (EBO OVL) structure with a minimum design rule, simulating a worst case process margin for the generated device layout of the EBO OVL structure, enabling a plurality of devices for the simulated worst case process margin for the generated device layout of the EBO OVL structure, and breaking a plurality of design rules for the enabled plurality of devices of the EBO OVL structure to generate an OVL measurement layout of the EBO OVL structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.