Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition
US10808142B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Mar 19, 2018 |
| Grant date | Oct 20, 2020 |
| Priority date | — |
| Expiry date | Mar 19, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/842
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are a method of preparing a graphene quantum dot, a graphene quantum dot prepared using the method, a hardmask composition including the graphene quantum dot, a method of forming a pattern using the hardmask composition, and a hardmask obtained from the hardmask composition. The method of preparing a graphene quantum dot includes reacting a graphene quantum dot composition and an including a polyaromatic hydrocarbon compound and an organic solvent at an atmospheric pressure and a temperature of about 250° C. The polyaromatic hydrocarbon compound may include at least four aromatic rings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.