Metrology system and method for determining a characteristic of one or more structures on a substrate
US10816909B2 · kind B2 · utility
5Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 3, 2018 |
| Grant date | Oct 27, 2020 |
| Priority date | — |
| Expiry date | Dec 26, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.