Patent · US Active

Methods of optical device fabrication using an electron beam apparatus

US10818472B2 · kind B2 · utility

1Cited by

9References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ludovic Godet · Sunnyvale, US
Rutger Meyer Timmerman Thijssen · Sunnyvale, US
Kartik Ramaswamy · San Jose, US
Yang Yang · San Diego, US
Manivannan Thothadri · Mountain View, US
Chien-An Chen · Holly Springs, US

Key dates

Filing date	Dec 17, 2019
Grant date	Oct 27, 2020
Priority date	—
Expiry date	Dec 17, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/334
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.