Yang Yang
62Patents
6h-index
67Co-inventors
71Inventor score
Filing activity: Mar 14, 2013 → Apr 5, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10707086B2 | Etching methods | Electricity | 36 | Active |
| US8734664B2 | Method of differential counter electrode tuning in an RF plasma reactor | Electricity | 23 | Active |
| US10544505B2 | Deposition or treatment of diamond-like carbon in a plasma reactor | Electricity | 14 | Active |
| US10249495B2 | Diamond like carbon layer formed by an electron beam plasma process | Electricity | 13 | Active |
| US11476090B1 | Voltage pulse time-domain multiplexing | Electricity | 10 | Active |
| US9161428B2 | Independent control of RF phases of separate coils of an inductively coupled plasma reactor | Electricity | 7 | Active |
| US9613783B2 | Method and apparatus for controlling a magnetic field in a plasma chamber | Electricity | 5 | Active |
| US11043372B2 | High-density low temperature carbon films for hardmask and other patterning applications | Electricity | 4 | Active |
| US11043375B2 | Plasma deposition of carbon hardmask | Electricity | 4 | Active |
| US10475626B2 | Ion-ion plasma atomic layer etch process and reactor | Electricity | 3 | Active |
| US10115566B2 | Method and apparatus for controlling a magnetic field in a plasma chamber | Electricity | 3 | Active |
| US9449794B2 | Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna | Electricity | 3 | Active |
| US10017857B2 | Method and apparatus for controlling plasma near the edge of a substrate | Electricity | 2 | Active |
| US11651966B2 | Methods and apparatus for processing a substrate | Electricity | 2 | Active |
| US12020901B2 | RF impedance matching networks for substrate processing platform | Electricity | 1 | Active |
| US11043387B2 | Methods and apparatus for processing a substrate | Electricity | 1 | Active |
| US10818472B2 | Methods of optical device fabrication using an electron beam apparatus | Electricity | 1 | Active |
| US11967483B2 | Plasma excitation with ion energy control | Electricity | 1 | Active |
| US11469097B2 | Carbon hard masks for patterning applications and methods related thereto | Electricity | 1 | Active |
| US11448977B1 | Gas distribution plate with UV blocker at the center | Electricity | 1 | Active |
| US11721525B2 | Sensorless RF impedance matching network | Electricity | 1 | Active |
| US10167560B2 | Method and apparatus for structural coloration of metallic surfaces | Chemistry; Metallurgy | 1 | Active |
| US10153139B2 | Multiple electrode substrate support assembly and phase control system | Electricity | 1 | Active |
| US10957518B2 | Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece | Electricity | 1 | Active |
| US11823868B2 | Hardware switch on main feed line in a radio frequency plasma processing chamber | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.