Patent · US Active

Self-assembled monolayer blocking with intermittent air-water exposure

US10818510B2 · kind B2 · utility

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16References
16Claims
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Assignee

Inventors

Key dates

Filing dateJan 28, 2019
Grant dateOct 27, 2020
Priority date—
Expiry dateJan 30, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/76849
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Implementations described herein generally relate to processes for the fabrication of semiconductor devices in which a self-assembled monolayer (SAM) is used to achieve selective area deposition. Methods described herein relate to alternating SAM molecule and hydroxyl moiety exposure operations which may be utilized to form SAM layers suitable for blocking deposition of subsequently deposited materials.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.