Patent · US Active

CVD or PVD reactor for coating large-area substrates

US10822701B2 · kind B2 · utility

0Cited by

0References

12Claims

0Family size

Assignee

AIXTRON SE · DE

Inventors

Walter Franken · Eschweiler, DE
Bernhard Zintzen · Heidelberg, DE
Henricus Wilhelmus Aloysius Janssen · Sint Anthonis, NL

Key dates

Filing date	Nov 18, 2015
Grant date	Nov 3, 2020
Priority date	—
Expiry date	May 30, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/52
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A CVD or PVD coating device comprises a housing and a gas inlet organ secured to the housing via a retaining device, the gas inlet organ having a gas outlet surface with gas outlet openings. The retaining device is only secured at its horizontal edge to the housing so as to stabilize the retaining device with respect to deformations and temperature. The gas inlet organ is secured, at a plurality of suspension points, to the retaining device by means of a plurality of hanging elements distributed over the entire horizontal surface of the retaining device. The retaining device has mechanical stabilization elements formed by a retaining frame having vertical walls that are interconnected at vertical connection lines. An actively cooled heat shield is situated between the retaining device and the gas inlet organ.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.