Patent · US Active

Polycrystalline silicon column and polycrystalline silicon wafer

US10825940B2 · kind B2 · utility

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7Claims
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Key dates

Filing dateAug 26, 2016
Grant dateNov 3, 2020
Priority date
Expiry dateJul 31, 2037

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A polycrystalline silicon wafer is provided. The polycrystalline silicon wafer, includes a plurality of silicon grains, wherein the carbon content of the polycrystalline silicon wafer is greater than 4 ppma, and the resistivity of the polycrystalline silicon wafer is greater than or equal to 1.55 Ω-cm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.