System and method for enhanced removal of metal hardmask using ultra violet treatment
US10828680B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Nov 10, 2014 |
| Grant date | Nov 10, 2020 |
| Priority date | — |
| Expiry date | Jul 28, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Systems and methods for cleaning a substrate include a combined treatment of hydrogen peroxide and ultraviolet (UV) irradiation. Specific embodiments include the direct irradiation with 185/254 nm UV of a spinning substrate immersed under a liquid film of dilute hydrogen peroxide solution. Such a cleaning treatment can result in about a 100% improvement of TiN strip rate compared to processing with the same hydrogen peroxide solution without UV exposure. Such method can also be executed at room temperature and still provide improved cleaning efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.