Ian J. Brown
28Patents
8h-index
26Co-inventors
75Inventor score
Filing activity: Nov 7, 1984 → Nov 1, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6820016B2 | Leak detection apparatus and method | Physics | 51 | Expired |
| US4587504A | Magnet assembly for use in NMR apparatus | Emerging Cross-Sectional Technologies | 43 | Expired |
| US7795148B2 | Method for removing damaged dielectric material | Electricity | 40 | Active |
| US6586510B1 | Removable emulsion pressure-sensitive adhesives | Emerging Cross-Sectional Technologies | 20 | Expired |
| US5492950A | Pressure-sensitive adhesives based on emulsion polymers | Chemistry; Metallurgy | 16 | Expired |
| USRE36782E | Magnet assembly for use in NMR apparatus | General | 15 | Expired |
| US6547887B1 | Multilayer pressure-sensitive adhesive label constructions | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7723237B2 | Method for selective removal of damaged multi-stack bilayer films | Electricity | 9 | Active |
| US8795952B2 | Line pattern collapse mitigation through gap-fill material application | Physics | 6 | Active |
| US4584549A | Magnet system | Electricity | 6 | Expired |
| US9735026B2 | Controlling cleaning of a layer on a substrate using nozzles | Electricity | 5 | Active |
| US7288483B1 | Method and system for patterning a dielectric film | Electricity | 3 | Expired |
| US9454081B2 | Line pattern collapse mitigation through gap-fill material application | Physics | 3 | Active |
| US10490402B2 | UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly | Performing Operations; Transporting | 2 | Active |
| US9513556B2 | Method and system of process chemical temperature control using an injection nozzle | Physics | 1 | Active |
| US8083862B2 | Method and system for monitoring contamination on a substrate | Emerging Cross-Sectional Technologies | 1 | Active |
| US9257292B2 | Etch system and method for single substrate processing | Electricity | 1 | Active |
| US10347503B2 | Method and hardware for enhanced removal of post etch polymer and hardmask removal | Electricity | 0 | Active |
| US11538684B2 | UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly | Performing Operations; Transporting | 0 | Active |
| US9327322B2 | Sonic energy to generate active species for surface preparation, cleaning, and etching | Chemistry; Metallurgy | 0 | Active |
| US10828680B2 | System and method for enhanced removal of metal hardmask using ultra violet treatment | Chemistry; Metallurgy | 0 | Active |
| US10249509B2 | Substrate cleaning method and system using atmospheric pressure atomic oxygen | Electricity | 0 | Active |
| US9075318B2 | Sequential stage mixing for a resist batch strip process | Electricity | 0 | Active |
| US10490399B2 | Systems and methodologies for vapor phase hydroxyl radical processing of substrates | Electricity | 0 | Active |
| US9852920B2 | Etch system and method for single substrate processing | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.