Holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber, apparatus for depositing a layer on a substrate, and method for aligning a substrate carrier supporting a substrate and a mask carrier

US10837111B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Tommaso Vercesi · Aschaffenburg, DE
• Dieter Haas · Bruchköbel, DE
• Stefan Bangert · Lauentheil, DE
• Oliver Heimel · Wabern, DE
• Daniele GISLON · Venezia, IT

Key dates

• Filing date: Jan 12, 2015
• Grant date: Nov 17, 2020
• Expiry date: Jan 12, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10K71/166
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.