Radio frequency filter system for a processing chamber
US10840062B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 14, 2019 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Oct 14, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H2007/013
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A radio frequency (RF) filter system for a substrate processing chamber comprises a first RF filter coupled to a first element of the processing chamber and a second RF filter coupled to the first element of the processing chamber. Each of the RF filters comprises a first filter stage configured to reject a first frequency, a second filter stage coupled to the first filter stage and configured to reject a second frequency, and a third filter stage coupled to the second filter stage and configured to reject the first frequency. Further, the first filter stage comprises a first inductor and a first capacitance, the second filter stage comprises a second inductor and a second capacitance, the third filter stage comprises a third inductor and a third capacitance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.