Michael G. Chafin
15Patents
9h-index
50Co-inventors
75Inventor score
Filing activity: May 11, 1995 → Oct 14, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5903428A | Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same | Emerging Cross-Sectional Technologies | 231 | Expired |
| US6095084A | High density plasma process chamber | Electricity | 140 | Expired |
| US5636098A | Barrier seal for electrostatic chuck | Electricity | 49 | Expired |
| US6151203A | Connectors for an electrostatic chuck and combination thereof | Electricity | 36 | Expired |
| US8270141B2 | Electrostatic chuck with reduced arcing | Emerging Cross-Sectional Technologies | 23 | Active |
| US6824748B2 | Heated catalytic treatment of an effluent gas from a substrate fabrication process | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6273958A | Substrate support for plasma processing | Electricity | 10 | Expired |
| US10840062B2 | Radio frequency filter system for a processing chamber | Electricity | 9 | Active |
| US7813103B2 | Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes | Electricity | 9 | Active |
| US7838430B2 | Plasma control using dual cathode frequency mixing | Electricity | 7 | Active |
| US9601301B2 | Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment | Electricity | 1 | Active |
| US10546731B1 | Method, apparatus and system for wafer dechucking using dynamic voltage sweeping | Electricity | 1 | Active |
| US9070536B2 | Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface | Electricity | 0 | Active |
| US11447868B2 | Method for controlling a plasma process | Electricity | 0 | Active |
| US8580693B2 | Temperature enhanced electrostatic chucking in plasma processing apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.