Liquid processing apparatus, liquid processing method, and storage medium
US10840081B2 · kind B2 · utility
1Cited by
3References
19Claims
0Family size
Assignee
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Key dates
| Filing date | May 30, 2019 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | May 30, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate liquid processing method includes immersing the substrate in a processing liquid for processing the substrate, detecting a conversion point at which a processing condition of the processing the substrate is changed, and changing the processing condition when the conversion point is detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.