Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide
US10840112B2 · kind B2 · utility
2Cited by
117References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2019 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Jan 18, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2235/9669
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Disclosed herein is a ceramic article or coating useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The ceramic article or coating is formed from a combination of yttrium oxide and zirconium oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.