Lithography optics adjustment and monitoring
US10845711B2 · kind B2 · utility
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10References
20Claims
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Key dates
| Filing date | Jun 13, 2019 |
| Grant date | Nov 24, 2020 |
| Priority date | — |
| Expiry date | Jun 13, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2001/4247
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.