Hydrogen generator for an ion implanter
US10847339B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 2019 |
| Grant date | Nov 24, 2020 |
| Priority date | — |
| Expiry date | Jan 21, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/265
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam. A gas box within the terminal housing has a hydrogen generator configured to produce hydrogen gas for the ion source. The gas box is electrically insulated from the terminal housing, and is further electrically coupled to the ion source. The ion source and gas box are electrically isolated from the terminal housing by a plurality of electrical insulators. A plurality of insulating standoffs electrically isolate the terminal housing from an earth ground. A terminal power supply electrically biases the terminal housing to a terminal potential with respect to the earth ground. An ion source power supply electrically biases the ion source to an ion source potential with respect to the terminal potential. Electrically conductive tubing electrically couples the gas box and ion source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.