Patent · US Active

Optical system, and method

US10852643B2 · kind B2 · utility

1Cited by

1References

19Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Dirk Juergens · Munich, DE
Kerstin Hild · Schwäbisch Gmünd, DE
Bernd Geh · Scottsdale, US

Key dates

Filing date	Sep 23, 2019
Grant date	Dec 1, 2020
Priority date	—
Expiry date	Sep 23, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG02B26/0825
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system for a lithography machine includes: a main mirror element and a manipulator device for positioning and/or orienting said main mirror element. The optical system also includes an optically active surface for reflecting radiation. The optical system further includes an actuator matrix positioned between the main mirror element and the optically active surface. The actuator matrix is configured to deform the optically active surface to influence the reflective properties of the optically active surface. A gap is present between the actuator matrix and a front side of the main mirror element so that the actuator matrix is spaced apart from the main mirror element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.