Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent
US10861681B2 · kind B2 · utility
1Cited by
36References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2018 |
| Grant date | Dec 8, 2020 |
| Priority date | — |
| Expiry date | Sep 4, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.