Patent · US Active

Film for applying compressive stress to ceramic materials

US10868899B2 · kind B2 · utility

0Cited by
3References
16Claims
0Family size

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Key dates

Filing dateJun 22, 2018
Grant dateDec 15, 2020
Priority date
Expiry dateJun 22, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F1/1637
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method to provide compressive stress to substrates includes depositing a film on a ceramic substrate at a deposition temperature (Td) to form an article, the film having a difference relative to the ceramic substrate at Td in a coefficient thermal expansion (CTE) of at least 1.0×10−6/K and a difference in a refractive index >0.10. At least a portion of the thickness the film is converted in at least one of composition, phase and microstructure by lowering or raising the temperature from Td to reach a changed temperature (Tc) that is at least 100° C. different from Td. The film converting conditions result in the converted film portion providing a difference in refractive index at the Tc between the converted film and the ceramic substrate of ≤|0.10|. The temperature of the article is then lowered to room temperature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.