Inventor · Gainesville, FL, US

Deepika Singh

24Patents
5h-index
32Co-inventors
69Inventor score

Filing activity: Sep 30, 1997 → Aug 16, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US6110620A Controlled crystallite size electrode Emerging Cross-Sectional Technologies 31 Expired
US7932534B2 High light extraction efficiency solid state light sources Electricity 11 Active
US6020088A Gamma niooh nickel electrodes Emerging Cross-Sectional Technologies 7 Expired
US9259819B2 CMP method for forming smooth diamond surfaces Emerging Cross-Sectional Technologies 6 Active
US9259818B2 Smooth diamond surfaces and CMP method for forming Emerging Cross-Sectional Technologies 6 Active
US8557133B2 Chemical mechanical polishing of silicon carbide comprising surfaces Electricity 3 Active
US9567492B2 Polishing of hard substrates with soft-core composite particles Electricity 3 Active
US11450926B2 Solid electrolyte separator bonding agent Emerging Cross-Sectional Technologies 3 Active
US9368367B2 Chemical mechanical polishing of silicon carbide comprising surfaces Electricity 2 Active
US8828874B2 Chemical mechanical polishing of group III-nitride surfaces Electricity 2 Active
US6270535A Method of forming CoOOH and NiOOH in a NiMH electrochemical cell and an electrochemical cell formed thereby Emerging Cross-Sectional Technologies 2 Expired
US6287724A Nickel metal hydride cells designed for high rate/low temperature performance Emerging Cross-Sectional Technologies 1 Expired
US9624266B2 Brachiatin D and process for production thereof Chemistry; Metallurgy 0 Active
US11840645B2 CMP composition for polishing hard materials Electricity 0 Active
US9878420B2 Method of chemical mechanical polishing of alumina Chemistry; Metallurgy 0 Active
US11078380B2 Hard abrasive particle-free polishing of hard materials Electricity 0 Active
US9551075B2 Chemical mechanical polishing of alumina Chemistry; Metallurgy 0 Active
US8652295B2 CMP tool implementing cyclic self-limiting CM process Electricity 0 Active
US8506835B2 Cyclic self-limiting CMP removal and associated processing tool Electricity 0 Active
US11820918B2 Hard abrasive particle-free polishing of hard materials Electricity 0 Active
US10868899B2 Film for applying compressive stress to ceramic materials Physics 0 Active
US12378587B2 Recombinant methanotrophic bacteria for indigo biosynthesis and methods thereof Chemistry; Metallurgy 0 Active
US11213927B2 CMP polishing pad conditioner Performing Operations; Transporting 0 Active
US11881596B2 Solid electrolyte separator bonding agent Emerging Cross-Sectional Technologies 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.