Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination
US10872804B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 10, 2018 |
| Grant date | Dec 22, 2020 |
| Priority date | — |
| Expiry date | Jul 22, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68764
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure relates to a semiconductor processing apparatus having a reaction chamber which can include a baseplate having an opening; a moveable substrate support configured to support a substrate; a movement element configured to move a substrate held on the substrate support towards the opening of the baseplate; a plurality of gas inlets positioned above and configured to direct gas downwardly towards the substrate support; and a sealing element configured to form a seal between the baseplate and the substrate support, the seal positioned at a greater radial distance from a center of the substrate support than an outer edge of the substrate support. In some embodiments, the sealing element can also include a plurality of apertures extend through the sealing element, the apertures configured to provide a flow path between a position below the sealing element to a position above the sealing element. Some embodiments include two or more stacked sealing elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.