Symmetric plasma source to generate pie shaped treatment
US10879042B2 · kind B2 · utility
3Cited by
1References
16Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 24, 2017 |
| Grant date | Dec 29, 2020 |
| Priority date | — |
| Expiry date | Nov 26, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/40
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Plasma source assemblies comprising a housing with an RF hot electrode having a body and a plurality of source electrodes extending vertically from the RF hot electrode toward the opening in a front face of the housing are described. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.