Method of designing lithography features by self-assembly of block copolymer
US10884333B2 · kind B2 · utility
0Cited by
0References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2014 |
| Grant date | Jan 5, 2021 |
| Priority date | — |
| Expiry date | Feb 5, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of design or verification for a self-assemblable block copolymer feature, the block copolymer feature including a first domain having a first polymer type and a second domain having a second polymer type, the method including, based on the length of the second polymer type or on an uncertainty in position of the first domain within the block copolymer feature calculated based on the length of the second polymer type, adjusting a parameter of the self-assembly process of a block copolymer feature or verifying a placement of a block copolymer feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.