In-situ chamber clean end point detection systems and methods using computer vision systems
US10895539B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2018 |
| Grant date | Jan 19, 2021 |
| Priority date | — |
| Expiry date | Apr 9, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system includes a camera mounted external to and adjacent to a window of a processing chamber configured to process semiconductor substrates. The window allows the camera to view a component in the processing chamber. The camera is configured to generate a video signal indicative of a status of the component during a process being performed in the processing chamber. The system further includes a controller coupled to the processing chamber. The controller is configured to control the camera, process the video signal from the camera, determine the status of the component based on the processing of the video signal, and determine whether to terminate the process based on the status of the component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.