Patent · US Active

Ruthenium precursors for ALD and CVD thin film deposition and uses thereof

US10906925B2 · kind B2 · utility

2Cited by

5References

8Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Benjamin Schmiege · Santa Clara, US
Jeffrey W. Anthis · San Jose, US
David Thompson · San Jose, US

Key dates

Filing date	Jan 20, 2020
Grant date	Feb 2, 2021
Priority date	—
Expiry date	Jan 20, 2040

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/50
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Metal coordination complexes comprising a metal atom coordinated to at least one diazabutadiene ligand having a structure represented by:where each R is independently a C1-C13 alkyl or aryl group and each R′ is independently H, C1-C10 alkyl or aryl group are described. Processing methods using the metal coordination complexes are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.