Patent · US Active

Mirror, in particular for a microlithographic projection exposure apparatus

US10908509B2 · kind B2 · utility

2Cited by

7References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Johannes Lippert · Buch am Wald, DE
Toralf Gruner · Hennef (Sieg), DE
Kerstin Hild · Schwäbisch Gmünd, DE

Key dates

Filing date	Sep 30, 2019
Grant date	Feb 2, 2021
Priority date	—
Expiry date	Sep 30, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mirror, in particular for a microlithographic projection exposure apparatus, has an optical effective surface and includes a substrate (11, 61, 71, 81, 91), a reflection layer system (16, 66, 76, 86, 96) for reflecting electromagnetic radiation impinging on the optical effective surface (10a, 60a, 70a, 80a, 90a), an electrode arrangement (13, 63, 73, 83) composed of a first material having a first electrical conductivity, the electrode arrangement being provided on the substrate, and a mediator layer (12, 62, 72, 82, 92) composed of a second material having a second electrical conductivity. The ratio between the first electrical conductivity and the second electrical conductivity is at least 100. The mirror also includes at least one compensation layer (88) which at least partly compensates for the influence of a thermal expansion of the electrode arrangement (83) on the deformation of the optical effective surface (80a).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.