Lithographic apparatus
US10935895B2 · kind B2 · utility
0Cited by
7References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2019 |
| Grant date | Mar 2, 2021 |
| Priority date | — |
| Expiry date | Aug 13, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/683
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.